Interface-Investigation of Clevios-layers


The hole injection barrier (HIB) at interfaces between the electrode material and the hole injection material in OLEDs is defined by the work function of the electrode and the size of the interface dipole. Using ultra violet photoelectron spectroscopy (UPS) and Kelvin-Probe (KP) measurements all three parameters can be determined. Furthermore, the combination of both methods helps to exclude errors that might be based on the measurement technique. The performance of organic electronic devices is highly effected by the surface morphology of the employed layers. Therefore the surface morphology of all electrode materials will be investigated before and after deposition of the hole injection layer (provided by H.C. Starck) using atomic force microscopy (AFM).


Principal Investigators
Koch, Norbert Prof. Dr. techn. (Details) (Structure, Dynamics and electronic Properties of Molecular Systems)

Duration of Project
Start date: 08/2009
End date: 07/2012

Research Areas
Experimental Condensed Matter Physics

Research Areas
Experimentelle Physik, kondensierte Materie

Last updated on 2020-13-03 at 23:05